(PhysOrg.com) -- IBM Research in Zurich has demonstrated a new nanoscale patterning technique that could replace electron beam lithography (EBL). The demonstration carved a 1:5 billion scale ...
Chip scaling is becoming more difficult at each process node, but the industry continues to find new and innovative ways to solve the problems at every turn. And so chipmakers continue to march down ...
What’s in store for chipmakers at 7nm, 5nm and beyond, and why atomic-level etch and deposition are getting new attention. Prabu Raja, group vice president and general manager for the Patterning and ...
(Nanowerk News) Scientists have managed to draw at high resolution and speed, local patterns in organic semiconductor films used in optoelectronic and photonic applications. The new method enables the ...
Body axes are molecular coordinate systems along which regulatory genes are activated. These genes then activate the development of anatomical structures in correct locations in the embryo. Thus, the ...
Double patterning is a class of technologies developed for photolithography to enhance the feature density of computer chips. The resolution of a photoresist pattern begins to blur at around 45 nm ...
SAN JOSE, Calif., Feb. 26, 2024 (GLOBE NEWSWIRE) -- Today at the SPIE Advanced Lithography + Patterning conference, Applied Materials, Inc. introduced a portfolio of products and solutions designed to ...
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